Study of loading effect during electron-beam exposure and etching process in photomask fabrication

被引：0
|
作者：
Choi, Ji-Hyeon [1 ]
Kim, Byung-Gook [1 ]
Jeon, Chan-Uk [1 ]
Cho, Sung-Yong [1 ]
Choi, Seong-Woon [1 ]
Sohn, Jung-Min [1 ]
机构：
[1] Semicodutor R and D Center, Samsung Electronics, San #24, Nongseo-Ri, Kiheung-Eup, Yongin-City, Kyunggi-Do, 449-711, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：6981 / 6984
相关论文
共 50 条
  • [31] Study of loading effect on dry etching process
    Chang, SM
    Chin, CC
    Wang, WC
    Lu, CL
    Chin, SC
    Hsieh, HC
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 228 - 233
  • [32] DRY ETCHING UTILIZING SHOWERED ELECTRON-BEAM ASSISTED ETCHING
    MATSUI, S
    WATANABE, H
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 337 - 340
  • [33] DEVELOPMENT OF AN ELECTRON-BEAM PROCESS FOR THE FABRICATION OF X-RAY NANOMASKS
    GENTILI, M
    GRELLA, L
    DIFABRIZIO, E
    LUCIANI, L
    BACIOCCHI, M
    FIGLIOMENI, M
    MAGGIORA, R
    MASTROGIACOMO, L
    CERRINA, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2938 - 2942
  • [34] ELECTRIC EFFECTS IN CONTAMINATION AND ELECTRON-BEAM ETCHING
    FOURIE, JT
    SCANNING ELECTRON MICROSCOPY, 1981, : 127 - 134
  • [35] ETCHING AND DAMAGE OF SPECIMEN BY ELECTRON-BEAM IRRADIATION
    YADA, K
    JOURNAL OF ELECTRON MICROSCOPY, 1979, 28 (01): : 58 - 59
  • [36] IN-PROCESS INSPECTION OF THE PARAMETERS OF THE ELECTRON-BEAM IN ELECTRON-BEAM WELDING
    BASHENKO, VV
    MITKEVICH, EA
    DETSIK, NN
    WELDING PRODUCTION, 1985, 32 (05): : 13 - 14
  • [37] Electron-beam microcolumn fabrication and testing
    Despont, M
    Staufer, U
    Stebler, C
    Gross, H
    Vettiger, P
    MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 69 - 72
  • [38] Dynamic analysis of a SCALPEL mask during electron-beam exposure
    Semke, WH
    Engelstad, RL
    Lovell, EG
    Liddle, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3587 - 3591
  • [39] ELECTRON-BEAM LITHOGRAPHY FOR MICROCIRCUIT FABRICATION
    AHMED, H
    ELECTRONICS AND POWER, 1976, 22 (07): : 433 - 436
  • [40] Study of photoresist etching and roughness formation in electron-beam generated plasmas
    Orf, Bryan J.
    Walton, Scott G.
    Leonhardt, Darrin
    Oehrlein, Gottlieb S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (03): : 779 - 784
12345