共 50 条
- [41] HIGH-DOSE RATE EFFECT OF FOCUSED-ION-BEAM BORON IMPLANTATION INTO SILICON JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (06): : L417 - L420
- [43] FOCUSED GA+ BEAM DIRECT IMPLANTATION FOR SI DEVICE FABRICATION JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 91 - 93
- [46] Micromachined multiple focused-ion-beam devices JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (02):
- [47] Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3181 - 3184
- [48] Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition OPTOMECHATRONIC MICRO/NANO DEVICES AND COMPONENTS II, 2006, 6376
- [49] Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition BOSTON TRANSDUCERS'03: DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2, 2003, : 179 - 181