Vacuum ultraviolet annealing of hydroxyapatite films grown by pulsed laser deposition

被引：0
|
作者：
Electron. and Electrical Engineering, University College London, Torrington Place, London WCIE 7JE, United Kingdom [1 ]
不详 [2 ]
不详 [3 ]
不详 [4 ]
不详 [5 ]
机构：
来源：
J Appl Phys | / 12卷 / 8410-8414期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
18
引用
收藏
相关论文
共 50 条
  • [41] Properties of ZnO thin films grown on Si substrates in vacuum and oxygen ambient by pulsed laser deposition
    Zhao, Jie
    Hu, Lizhong
    Liu, Weifeng
    Wang, Zhaoyang
    APPLIED SURFACE SCIENCE, 2007, 253 (14) : 6255 - 6258
  • [42] Ultraviolet assisted pulsed laser deposition of thin oxide films
    Craciun, V
    Howard, J
    Singh, RK
    MULTICOMPONENT OXIDE FILMS FOR ELECTRONICS, 1999, 574 : 193 - 197
  • [43] Hydroxyapatite thin films grown by pulsed laser deposition and radio-frequency magnetron sputtering: comparative study
    Nelea, V
    Morosanu, C
    Iliescu, M
    Mihailescu, IN
    APPLIED SURFACE SCIENCE, 2004, 228 (1-4) : 346 - 356
  • [44] Properties of TiC thin films grown by pulsed laser deposition
    Santerre, F
    El Khakani, MA
    Chaker, M
    Dodelet, JP
    APPLIED SURFACE SCIENCE, 1999, 148 (1-2) : 24 - 33
  • [45] CAICISS characterization of GaN films grown by pulsed laser deposition
    Ohta, J
    Fujioka, H
    Furusawa, M
    Sasaki, A
    Yoshimoto, M
    Koinuma, H
    Sumiya, M
    Oshima, M
    JOURNAL OF CRYSTAL GROWTH, 2002, 237 (1-4 II) : 1153 - 1157
  • [46] Characterization of tantalum oxide films grown by pulsed laser deposition
    Boughaba, S
    Islam, MU
    Sproule, GI
    Graham, MJ
    SURFACE & COATINGS TECHNOLOGY, 1999, 120 : 757 - 764
  • [47] Highly oriented α-alumina films grown by pulsed laser deposition
    KTH/Royal Inst of Technology, Stockholm, Sweden
    Thin Solid Films, 1-2 (243-247):
  • [48] Epitaxial MnO thin films grown by pulsed laser deposition
    Neubeck, W
    Ranno, L
    Hunt, MB
    Vettier, C
    Givord, D
    APPLIED SURFACE SCIENCE, 1999, 138 : 195 - 198
  • [49] Raman investigations of GaN films grown by pulsed laser deposition
    Klose, M
    Dassow, R
    Gross, M
    Schroder, H
    JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 666 - 671
  • [50] Characteristics of titanium nitride films grown by pulsed laser deposition
    Chowdhury, R
    Vispute, RD
    Jagannadham, K
    Narayan, J
    JOURNAL OF MATERIALS RESEARCH, 1996, 11 (06) : 1458 - 1469
12345