Anisotropic etching of submicronic resist structures by resonant inductive plasma etching

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[1] Etrillard, Jackie
[2] Francou, Jean-Marc
[3] Inard, Alain
[4] Henry, Daniel
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Etrillard, Jackie | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
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Etching;
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