Computer simulation of ion beam etching process in fabricating refractive microlens

被引:0
|
作者
Chen, Changhong
Yi, Xinjian
Zhao, Xingrong
机构
来源
Weixi Jiagong Jishu/Microfabrication Technology | 2000年 / 02期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:34 / 38
相关论文
共 50 条
  • [31] ION-BEAM ETCHING
    GLOERSEN, PG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 28 - 35
  • [32] ION-BEAM ETCHING
    LIEBEL, G
    F&M-FEINWERKTECHNIK & MESSTECHNIK, 1987, 95 (07): : 436 - 440
  • [33] Light beam collimation of semiconductor lasers using refractive microlens array
    Zhang, Xinyu
    Tang, Qingle
    Zhang, Zhi
    Yi, Xinjian
    Huazhong Ligong Daxue Xuebao/Journal Huazhong (Central China) University of Science and Technology, 2000, 28 (07): : 4 - 6
  • [34] Computer simulation studies of roughness of thin films formed in the ion beam assisted deposition (IBAD) process
    Oleszkiewicz, Waldemar
    Romiszowski, Piotr
    OPTICA APPLICATA, 2005, 35 (03) : 495 - 501
  • [35] Liquid Gradient Refractive Index Microlens for Dynamically Adjusting the Beam Focusing
    Le, Zichun
    Sun, Yunli
    Du, Ying
    MICROMACHINES, 2015, 6 (12): : 1984 - 1995
  • [36] COMPUTER SIMULATION OF THE ION SPUTTER PROFILING PROCESS.
    Qu, Zhe
    Xie, Tiansheng
    Jinshu Xuebao/Acta Metallurgica Sinica, 1986, 22 (05):
  • [37] Computer simulation of ion beam analysis of laterally inhomogeneous materials
    Mayer, M.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2016, 371 : 90 - 96
  • [38] An improved process for fabricating microlens array with high fill factor and controllable configuration
    Tsou, Chinofu
    Lin, Chienhung
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2008, 17 (04) : 1047 - 1057
  • [39] Simple kinetic model of ECR reactive ion beam etching reactor for the optimization of GaAs etching process
    Sugiyama, Masakazu
    Yamaizumi, Takayuki
    Nezuka, Masahiro
    Shimogaki, Yukihiro
    Nakano, Yoshiaki
    Tada, Kunio
    Komiyama, Hiroshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (2 B): : 1235 - 1241
  • [40] Simple kinetic model of ECR reactive ion beam etching reactor for the optimization of GaAs etching process
    Sugiyama, M
    Yamaizumi, T
    Nezuka, M
    Shimogaki, Y
    Nakano, Y
    Tada, K
    Komiyama, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (2B): : 1235 - 1241