Determination of precursor conversion in a multiwafer hot-wall chemical vapor deposition (CVD) reactor

被引：0
|
作者：
Tesfaghiorghis, Yemane [1 ]
Loney, Norman W. [1 ]
机构：
[1] New Jersey Inst of Technology, Newark, United States
来源：
Journal of Materials Synthesis and Processing | 1995年 / 3卷 / 06期
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摘要：
5
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页码：415 / 417
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