Continuously deposited duplex coatings consisting of plasma nitriding and a-C:H:Si deposition

被引：0
|
作者：
Michler, T. [1 ]
Grischke, M. [1 ]
Bewilogua, K. [1 ]
Hieke, A. [1 ]
机构：
[1] Fraunhofer Inst for Surface, Engineering and Thin Films, Braunschweig, Germany
来源：
Surface and Coatings Technology | 1999年 / 111卷 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：41 / 45
相关论文
共 50 条
  • [41] The effect of Si incorporation on the corrosion resistance of a-C:H:SiOx coatings
    Batory, D.
    Jedrzejczak, A.
    Kaczorowski, W.
    Kolodziejczyk, L.
    Burnat, B.
    DIAMOND AND RELATED MATERIALS, 2016, 67 : 1 - 7
  • [42] Internal stress of a-C:H(N) films deposited by radio frequency plasma enhanced chemical vapor deposition
    Cheng, YH
    Wu, YP
    Chen, JG
    Qiao, XL
    Xie, CS
    DIAMOND AND RELATED MATERIALS, 1999, 8 (07) : 1214 - 1219
  • [43] Synthesis, characterization and nanostructuring of (a-C:H):Si and (a-C:H):Si:metal films
    Kirpilenko, G. G.
    Frolov, V. D.
    Zavedeev, E. V.
    Pimenov, S. M.
    Konov, V. I.
    Shelukhin, E. Y.
    Loubnin, E. N.
    DIAMOND AND RELATED MATERIALS, 2006, 15 (4-8) : 1147 - 1150
  • [44] On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition
    Cheng, YH
    Wu, YP
    Chen, JG
    Qiao, XL
    Xie, CS
    Tay, BK
    Lau, SP
    Shi, X
    SURFACE & COATINGS TECHNOLOGY, 2000, 135 (01): : 27 - 33
  • [45] Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method
    Dong, Xiao
    Koga, Kazunori
    Yamashita, Daisuke
    Seo, Hyunwoong
    Itagaki, Naho
    Shiratani, Masaharu
    Setsuhara, Yuichi
    Sekine, Makoto
    Hori, Masaru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (01)
  • [46] Development of a-C:H coatings doped with trimethylsilyl acetate prepared using plasma enhanced chemical vapor deposition
    Kelarova, Stepanka
    Vaclavik, Richard
    Pribyl, Roman
    Stupavska, Monika
    Bursikova, Vilma
    DIAMOND AND RELATED MATERIALS, 2024, 147
  • [47] Effect of Si and C concentration on the microstructure, and the mechanical, tribological and electrochemical properties of nanocomposite TiC/a-SiC:H/a-C:H coatings prepared by plasma enhanced chemical vapor deposition
    Li, Duanjie
    Hassani, Salim
    Poulin, Suzie
    Szpunar, Jerzy A.
    Martinu, Ludvik
    Klemberg-Sapieha, Jolanta E.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (04)
  • [48] Electrical properties of (a-C:H)/Si and (a-C:H)/Ti heterostructures
    Tinchev, S.
    Dyulgerska, Y.
    Nikolova, P.
    Alexandrova, S.
    Valcheva, E.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (02): : 386 - 389
  • [49] Plasma deposition of hard coatings - Duplex treatment
    Zlatanovic, MD
    Kunosic, AM
    Belosevac, RB
    Popovic, NV
    ADVANCED MATERIALS FOR HIGH TECHNOLOGY APPLICATIONS, 1996, 214 : 179 - 188
  • [50] Mechanical properties and Raman spectra of a-C:H and a-C:H:N coatings
    Vyskocil, J
    Siroky, P
    Vorlicek, V
    Perina, V
    DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) : 466 - 470
12345