Continuously deposited duplex coatings consisting of plasma nitriding and a-C:H:Si deposition

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作者：
Michler, T. [1 ]
Grischke, M. [1 ]
Bewilogua, K. [1 ]
Hieke, A. [1 ]
机构：
[1] Fraunhofer Inst for Surface, Engineering and Thin Films, Braunschweig, Germany
来源：
Surface and Coatings Technology | 1999年 / 111卷 / 01期
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页码：41 / 45
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