Local interface composition and native stacking fault density in ZnSe/GaAs(001) heterostructures

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[1] [1,2,Colli, A.
[2] Carlino, E.
[3] 1,Pelucchi, E.
[4] Grillo, V.
[5] 1,Franciosi, A.
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Colli, A. | 1600年 / American Institute of Physics Inc.卷 / 96期
关键词
Composition - High resolution electron microscopy - Interfaces (materials) - Nucleation - Reaction kinetics - Semiconducting gallium arsenide - Semiconducting zinc compounds - Stacking faults - Surface phenomena - Synthesis (chemical) - Transmission electron microscopy;
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摘要
Interface structure and composition in pseudomorphic ZnSe/GaAs(001) heterostructures grown using interface fabrication procedures were compared. The fabrication procedures produce epilayers with minimum stacking fault densities. A 1 nm thick intermixed region at the interface that was depleted of As and comprised of a As alloy with zincblende structure was detected. Results indicate that Ga-Se reactions at the ZnSe/GaAs interface do not necessarily leads to nucleation of high densities of stacking faults.
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