INFLUENCE OF DEPOSITION CONDITIONS ON SPUTTER-DEPOSITED AMORPHOUS SILICON.

被引:0
|
作者
Pawlewicz, W.T. [1 ]
机构
[1] Materials Department, Battelle, Pacific Northwest Laboratories, Richland, WA 99352, United States
来源
| 1600年 / 49期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
19
引用
收藏
相关论文
共 50 条
  • [41] DETERMINATION OF ULTRATRACE HYDROGEN IN SPUTTER-DEPOSITED ALUMINUM FILM ON SILICON SUBSTRATE
    TOMITA, H
    KIKUCHI, T
    FURUYA, K
    BUNSEKI KAGAKU, 1990, 39 (10) : 553 - 558
  • [42] Influence of the substrate on the structural properties of sputter-deposited ZnO films
    Kim, HW
    Kim, NH
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2004, 201 (02): : 235 - 238
  • [43] AMORPHOUS SILICON.
    Morigaki, K.
    Nitta, S.
    1987, : 53 - 96
  • [44] Influence of annealing on the residual stress in sputter-deposited platinum films
    Härting, M
    Ntsoane, TP
    Bucher, R
    ADVANCED ENGINEERING MATERIALS, 2002, 4 (08) : 607 - 609
  • [45] Sputter-deposited PZT-on-Silicon electro-optic modulator
    Singh, Suraj
    Selvaraja, Shankar Kumar
    2021 ANNUAL CONFERENCE OF THE IEEE PHOTONICS SOCIETY (IPC), 2021,
  • [46] RESISTIVITY OF PHOSPHORUS-DOPED SPUTTER-DEPOSITED POLYCRYSTALLINE SILICON FILMS
    GABILLI, E
    GUERRI, S
    MASETTI, G
    SEVERI, M
    SOLID-STATE ELECTRONICS, 1977, 20 (11) : 925 - 930
  • [47] Influence of deposition parameters on the stress of magnetron sputter-deposited AlN thin films on Si(100) substrates
    Iriarte, GF
    Engelmark, F
    Ottosson, M
    Katardjiev, IV
    JOURNAL OF MATERIALS RESEARCH, 2003, 18 (02) : 423 - 432
  • [48] Stress in sputter-deposited Cr films: Influence of ar pressure
    Grachev, SY
    Tichelaar, FD
    Janssen, GCAM
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (07)
  • [49] The relation between amorphous structure and explosive crystallization of sputter-deposited amorphous germanium thin films
    Okugawa, Masayuki
    Nakamura, Ryusuke
    Numakura, Hiroshi
    Heya, Akira
    Matsuo, Naoto
    Yasuda, Hidehiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58 (04)
  • [50] Influence of deposition rate on the formation of growth twins in sputter-deposited 330 austenitic stainless steel films
    Zhang, X.
    Anderoglu, O.
    Misra, A.
    Wang, H.
    APPLIED PHYSICS LETTERS, 2007, 90 (15)