Defect creation by low-energy ion bombardment on GaAs (001) and Ge (001) surfaces

被引:0
|
作者
Kuronen, A. [1 ]
Tarus, J. [2 ]
Nordlund, K. [2 ]
机构
[1] Helsinki University of Technology, Lab. of Compl. Eng., P.O. Box 9400, Fin-02015 HUT, Finland
[2] University of Helsinki, Accel. Lab., P.O. Box 47, Univ. H., Fin-00014, Finland
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:209 / 212
相关论文
共 50 条
  • [41] INITIAL-STAGES OF THE FORMATION OF THE AU/GAAS(001) INTERFACE - A LOW-ENERGY ION-SCATTERING STUDY
    CHARATAN, RM
    WILLIAMS, RS
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (11) : 5226 - 5232
  • [42] Range of defect morphologies on GaAs grown on offcut (001) Ge substrates
    Ting, SM
    Fitzgerald, EA
    Sieg, RM
    Ringel, SA
    JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (05) : 451 - 461
  • [43] Electronic structure of nitinol surfaces oxidized by low-energy ion bombardment
    Petravic, M.
    Varasanec, M.
    Peter, R.
    Kavre, I.
    Metikos-Hukovic, M.
    Yang, Y. -W.
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (24)
  • [44] SPUTTERING OF Si(001) AND SiC(001) BY GRAZING ION BOMBARDMENT
    Elmonov, A. A.
    Yusupov, M. S.
    Dzhurakhalov, A. A.
    Bogaerts, A.
    24TH SUMMER SCHOOL AND INTERNATIONAL SYMPOSIUM ON THE PHYSICS OF IONIZED GASES, CONTRIBUTED PAPERS, 2008, (84): : 209 - +
  • [45] Effects of high-flux low-energy ion bombardment on the low-temperature growth morphology of TiN(001) epitaxial layers
    Karr, BW
    Cahill, DG
    Petrov, I
    Greene, JE
    PHYSICAL REVIEW B, 2000, 61 (23): : 16137 - 16143
  • [47] Structure of InP (001) surfaces prepared by decapping and by ion bombardment and annealing
    Pahlke, D
    Kinsky, J
    Schultz, C
    Pristovsek, M
    Zorn, M
    Esser, N
    Richter, W
    PHYSICAL REVIEW B, 1997, 56 (04) : R1661 - R1663
  • [48] Ge growth on GaAs(001) surfaces studied by reflectance anisotropy spectroscopy
    Emiliani, V
    Frisch, AM
    Goletti, C
    Esser, N
    Richter, W
    Fimland, BO
    PHYSICAL REVIEW B, 2002, 66 (08): : 853051 - 853057
  • [49] RADIATION-DAMAGE IN SILICON (001) DUE TO LOW-ENERGY (60-510 EV) ARGON ION-BOMBARDMENT
    ALBAYATI, AH
    ORRMANROSSITER, KG
    BADHEKA, R
    ARMOUR, DG
    SURFACE SCIENCE, 1990, 237 (1-3) : 213 - 231
  • [50] GaAs surface cleaning by low-energy hydrogen ion bombardment at moderate temperatures
    Schubert, E
    Razek, N
    Frost, F
    Schindler, A
    Rauschenbach, B
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (02)