Influence of cesium vapor on the properties of ITO films deposited by RF magnetron sputtering

被引:0
|
作者
机构
[1] Lee, Shih-Nan
[2] Yan, Ruei-Chih
[3] Chen, Chin H.
来源
Chen, C.H. | / National Chiao Tung University, Taiwan; Air Force Office of Scientific Research; Color Imaging Industry Promotion Office/Industrial Dev. Bureau; Electronics Research and Service Organization; Ministry of Education; et al卷 / Society for Information Display期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] Optical properties of zinc nitride films deposited by the rf magnetron sputtering method
    Jayatissa, Ahalapitiya H.
    Wen, Ting
    Gautam, Madhav
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (04)
  • [42] Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering
    Lu, YM
    Hwang, WS
    Yang, JS
    Chuang, HC
    THIN SOLID FILMS, 2002, 420 : 54 - 61
  • [43] Structure effect on electrical properties of ITO films prepared by rf reactive magnetron sputtering
    Meng, LJ
    dosSantos, MP
    THIN FILMS FOR PHOTOVOLTAIC AND RELATED DEVICE APPLICATIONS, 1996, 426 : 431 - 436
  • [44] Structural and optical properties of silver thin films deposited by RF magnetron sputtering
    Rizzo, A
    Tagliente, MA
    Alvisi, M
    Scaglione, S
    THIN SOLID FILMS, 2001, 396 (1-2) : 29 - 35
  • [45] Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
    Dong Hyun Hwang
    Jung Hoon Ahn
    Kwun Nam Hui
    Kwan San Hui
    Young Guk Son
    Nanoscale Research Letters, 7
  • [46] Microstructural and optoelectronic properties of polycrystalline InP films deposited by RF magnetron sputtering
    Chandra, G. Hema
    Perez de la Cruz, J.
    JOURNAL OF CRYSTAL GROWTH, 2012, 354 (01) : 67 - 75
  • [47] Preparation and properties of GeC thin films deposited by reactive RF magnetron sputtering
    Li Yang-Ping
    Liu Zheng-Tang
    Liu Wen-Ting
    Yan Feng
    Chen Jing
    ACTA PHYSICA SINICA, 2008, 57 (10) : 6587 - 6592
  • [48] Structural and optical properties of amorphous MCT films deposited by RF magnetron sputtering
    Kong, Jincheng
    Kong, Lingde
    Zhao, Jun
    Zhang, Pengju
    Li, Hongzhi
    Li, Xiongjun
    Wang, Shanli
    Ji, Rongbin
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2008, 29 (04): : 733 - 736
  • [49] Effects of substrates on the structural properties of ZnO films deposited by rf magnetron sputtering
    Cha, Chun Nam
    Choi, Mu Hee
    Ma, Tae Young
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2012, 15 (03) : 240 - 243
  • [50] Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering
    Bodeux, Romain
    Michau, Dominique
    Josse, Michael
    Maglione, Mario
    SOLID STATE SCIENCES, 2014, 38 : 112 - 118