Structural characterization of a Mo/Ru/Si extreme ultraviolet (EUV) reflector by optical modeling

被引:0
|
作者
机构
[1] Kang, In-Yong
[2] Kim, Tae Geun
[3] Lee, Seung Yoon
[4] Ahn, Jinho
[5] Chung, Yong-Chae
来源
Kang, I.-Y. | 1600年 / Japan Society of Applied Physics卷 / 43期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] Pattern printability for variation in thickness of a Mo/Si mask blank in extreme ultraviolet lithography
    Sugawara, M
    Chiba, A
    Yamanashi, H
    Nishiyama, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (01): : 78 - 85
  • [42] Influence of glass substrate surface roughness on extreme ultraviolet reflectivity of Mo/Si multilayer
    Miyagaki, S
    Yamanashi, H
    Yamaguchi, A
    Nishiyama, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3063 - 3066
  • [43] Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors
    Freitag, JM
    Clemens, BM
    APPLIED PHYSICS LETTERS, 1998, 73 (01) : 43 - 45
  • [44] Optimization of ion-beam-deposited Mo/Si multilayers for extreme ultraviolet masks
    Rook, Katrina
    Turner, Paul
    Srinivasan, Narasimhan
    Yamamoto, Kenji
    Henry, Tania
    Lee, Meng H.
    JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2021, 20 (02):
  • [45] Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors
    Soer, Wouter A.
    van Herpen, Maarten M. J. W.
    Jak, Martin J. J.
    Gawlitza, Peter
    Braun, Stefan
    Salashchenko, Nikolay N.
    Chkhalo, Nikolay I.
    Banine, Vadim Y.
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [46] Optical and structural characterization of reflective quarter wave plates for EUV range
    Gaballah, A. E. H.
    Zuppella, P.
    Corso, A. J.
    Nicolosi, P.
    SPACE TELESCOPES AND INSTRUMENTATION 2016: ULTRAVIOLET TO GAMMA RAY, 2016, 9905
  • [47] Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light
    Hu, Min-Hui
    Le Guen, Karine
    Andre, Jean-Michel
    Jonnard, Philippe
    Meltchakov, Evgueni
    Delmotte, Franck
    Galtayries, Anouk
    OPTICS EXPRESS, 2010, 18 (19): : 20019 - 20028
  • [48] Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography
    Stuik, R
    Louis, E
    Yakshin, AE
    Görts, PC
    Maas, ELG
    Bijkerk, F
    Schmitz, D
    Scholze, F
    Ulm, G
    Haidl, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2998 - 3002
  • [49] Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering
    Haase, Anton
    Soltwisch, Victor
    Scholze, Frank
    Braun, Stefan
    OPTICAL SYSTEMS DESIGN 2015: OPTICAL FABRICATION, TESTING, AND METROLOGY V, 2015, 9628
  • [50] Stress, reflectance, and temporal stability of sputter-deposited Mo Si and Mo Be multilayer films for extreme ultraviolet lithography
    Mirkarimi, PB
    OPTICAL ENGINEERING, 1999, 38 (07) : 1246 - 1259