Thermal stability of plasma-treated ohmic contacts to n-GaN

被引：0
|
作者：
Lee, Chien-Chi [1 ]
Lin, Sheng-Di [1 ]
Lee, Chien-Ping [1 ]
Yeh, Meng-Hsin [2 ]
Lee, Wei-I [2 ]
Kuo, Cheng-Ta [3 ]
机构：
[1] Dept. of Electronics Engineering, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan
[2] Department of Electrophysics, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu, Taiwan
[3] R and D Department, Advanced Epitaxy Technology Inc., 119 Kuangfu N. Road, Hsinchu Industrial Park, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 4 B期
关键词：
High temperature aging tests - Plasma treatment - Specific contact resistance;
D O I：
10.1143/jjap.42.2313
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：2313 / 2315
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