REPAIR OF CLEAR X-RAY MASK DEFECTS BY LASER-INDUCED METAL DEPOSITION.

被引：3
|
作者：
Petzold, H.-C. [1 ]
Putzar, R. [1 ]
Weigmann, U. [1 ]
Wilke, I. [1 ]
机构：
[1] Fraunhofer-Inst fuer, Mikrostrukturtechnik, Berlin, West, Ger, Fraunhofer-Inst fuer Mikrostrukturtechnik, Berlin, West Ger
来源：
Microelectronic Engineering | 1987年 / 6卷 / 1-4期
关键词：
The authors like to thank Dr. W. BrUnger; A; Hoyer; and A. Umbach for the Auger analysis and H. Staiger for experimental assistance. Dr. H. Schr~der of Max-Planck-lnstitute for Quantum Optics; Garching; is acknowledged for supplying the organometallic gold compound and Dr. F. Bachmann of Siemens; MUnchen; for placing the DRSII mask repair system at our disposal. This work was funded by the Ministry of Research and Technology of the Federal Republic of Germany;
D O I：
10.1016/0167-9317(87)90097-9
中图分类号：
学科分类号：
摘要：
1
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页码：623 / 628
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