Corrugated structures on Si(110) surfaces treated in ammonium fluoride solutions

被引：0
|
作者：
Fujita, Ken [1 ]
Hirashita, Norio [1 ]
机构：
[1] Oki Electric Industry Co, Ltd, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1994年 / 33卷 / 8 B期
关键词：
Absorption spectroscopy - Ammonium compounds - Bonding - Electron beams - Electron diffraction - Etching - Hydrogen - Infrared spectrometers - Light polarization - Silicon - Solutions - Surfaces;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
We have investigated structures on Si (110) surfaces treated in ammonium fluoride solutions using infrared light absorption spectroscopy and reflection high-energy electron diffraction. It has been found that the surface is smoothed along the [11¯0] direction, while corrugation remains across the [11¯0] direction on an atomic scale. The surface has been found to be determined by coupled monohydride with the same stretch vibration frequency of monohydride at step edges on vicinal Si (111) surfaces. The absorption coefficient of coupled monohydride has been compared to that of uncoupled monohydride on Si (111) terraces.
引用
收藏
相关论文
共 50 条
  • [31] THE GEOMETRIC STRUCTURES OF THE GAAS(111) AND (110) SURFACES
    TONG, SY
    MEI, WN
    XU, G
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (03): : 393 - 398
  • [32] SURFACE-STRUCTURES AND GROWTH MODE FOR THE CU/SI(110) SURFACES DEPENDING ON HEAT-TREATMENT
    IKEDA, T
    KAWASHIMA, Y
    ITOH, H
    ICHINOKAWA, T
    SURFACE SCIENCE, 1995, 342 (1-3) : 11 - 20
  • [33] SURFACE-STRUCTURES IN SUBMONOLAYER B/SI(110) AND (AL,B)/SI(110) SYSTEMS
    ZOTOV, AV
    RYZHKOV, SV
    LIFSHITS, VG
    KRISTALLOGRAFIYA, 1994, 39 (03): : 526 - 529
  • [34] In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions
    Hoffmann, PM
    Vermeir, IE
    Natarajan, A
    Searson, PC
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (03) : 1545 - 1549
  • [35] In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions
    Johns Hopkins Univ, Baltimore, United States
    J Appl Phys, 3 (1545-1549):
  • [36] MORPHOLOGY OF HYDROFLUORIC-ACID AND AMMONIUM FLUORIDE-TREATED SILICON SURFACES STUDIED BY SURFACE INFRARED-SPECTROSCOPY
    NIWANO, M
    TAKEDA, Y
    ISHIBASHI, Y
    KURITA, K
    MIYAMOTO, N
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (11) : 5646 - 5649
  • [37] Adsorption and abstraction of atomic hydrogen on the Si(110) surfaces
    Khan, A. R.
    Narita, Y.
    Namiki, A.
    Kato, A.
    Suernitsu, M.
    SURFACE SCIENCE, 2008, 602 (11) : 1979 - 1986
  • [38] Abstraction of α-deuterium on Si(110) surfaces with H atoms
    Lutterloh, C
    Dinger, A
    Küppers, J
    SURFACE SCIENCE, 2001, 482 : 233 - 236
  • [39] ATOMIC CONFIGURATION OF HYDROGENATED AND CLEAN SI(110) SURFACES
    AMPO, H
    MIURA, S
    KATO, K
    OHKAWA, Y
    TAMURA, A
    PHYSICAL REVIEW B, 1986, 34 (04): : 2329 - 2335
  • [40] PHASE-TRANSITIONS ON CLEAN SI(110) SURFACES
    OLSHANETSKY, BZ
    SHKLYAEV, AA
    SURFACE SCIENCE, 1977, 67 (02) : 581 - 588
12345