Chemical vapor deposited copper from alkyne stabilized copper (I) hexafluoroacetylacetonate complexes

被引：0
|
作者：
机构：
[1] Baum, Thomas H.
[2] Larson, Carl E.
来源：
Baum, Thomas H. | 1600年 / 140期
关键词：
Alkyne stabilized copper complexes - Chemical vapor deposited copper - Hexafluoroacetylacetonate complexes;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] CHEMICAL VAPOR-DEPOSITED COPPER FROM ALKYNE STABILIZED COPPER(I) HEXAFLUOROACETYLACETONATE COMPLEXES
    BAUM, TH
    LARSON, CE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) : 154 - 159
  • [2] CHEMICAL VAPOR-DEPOSITION OF COPPER FROM (HEXAFLUOROACETYLACETONATO)(ALKYNE)-COPPER(I) COMPLEXES VIA DISPROPORTIONATION
    JAIN, A
    CHI, KM
    KODAS, TT
    HAMPDENSMITH, MJ
    FARR, JD
    PAFFETT, MF
    CHEMISTRY OF MATERIALS, 1991, 3 (06) : 995 - 997
  • [3] ORGANIC LIGAND-STABILIZED COPPER(I) HEXAFLUOROACETYLACETONATE COMPLEXES FOR COPPER CVD
    BAUM, TH
    LARSON, CE
    REYNOLDS, SK
    SMART, CJ
    BAREN, EE
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 156 - COLL
  • [4] CHEMICAL VAPOR-DEPOSITION OF COPPER FROM COPPER (II) HEXAFLUOROACETYLACETONATE
    TEMPLE, D
    REISMAN, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (11) : 3525 - 3529
  • [5] Incubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-vinyltrimethoxysilane
    Hong, LS
    Jeng, MG
    APPLIED SURFACE SCIENCE, 2000, 161 (1-2) : 149 - 154
  • [6] CHEMICAL VAPOR-DEPOSITION OF COPPER FROM 1,5-CYCLOOCTADIENE COPPER(I) HEXAFLUOROACETYLACETONATE
    REYNOLDS, SK
    SMART, CJ
    BARAN, EF
    BAUM, TH
    LARSON, CE
    BROCK, PJ
    APPLIED PHYSICS LETTERS, 1991, 59 (18) : 2332 - 2334
  • [7] Effects of the partial pressure of copper (I) hexafluoroacetylacetonate trimethylvinylsilane on the chemical vapor deposition of copper
    Korea Advanced Inst of Science and, Technology, Taejon, Korea, Republic of
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 8 (5249-5252):
  • [8] CHEMICAL VAPOR-DEPOSITION OF COPPER FROM 1,5-CYCLOOCTADIENE COPPER(I) HEXAFLUOROACETYLACETONATE
    REYNOLDS, SK
    SMART, CJ
    BARAN, EF
    BAUM, TH
    LARSON, CE
    BROCK, PJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 29 - COLL
  • [9] Effects of the partial pressure of copper (I) hexafluoroacetylacetonate trimethylvinylsilane on the chemical vapor deposition of copper
    Lee, SY
    Rha, SK
    Lee, WJ
    Kim, DW
    Hwang, JS
    Park, CO
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (08): : 5249 - 5252
  • [10] Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane
    Son, JH
    Park, MY
    Rhee, SW
    THIN SOLID FILMS, 1998, 335 (1-2) : 229 - 236
12345