共 50 条
- [2] Characterisation of low energy antimony (2-5 keV) implantation into silicon IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 2003, : 147 - 150
- [4] LOW-ENERGY ION BEAM OXIDATION OF SILICON. Electron device letters, 1986, EDL-7 (08): : 468 - 470
- [5] CRITICAL ENERGY FOR DAMAGE AT SILICON SURFACES BOMBARDED WITH LOW-ENERGY ARGON IONS APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 39 (02): : 95 - 99
- [6] CRITICAL ENERGY FOR DAMAGE AT SILICON SURFACES BOMBARDED WITH LOW-ENERGY ARGON IONS. Applied Physics A: Solids and Surfaces, 1986, A39 (02): : 95 - 99
- [7] LOW-ENERGY ARGON IMPLANTATION IN (111) SILICON BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1968, 13 (06): : 907 - &
- [8] Dose rate and thermal budget optimization for ultrashallow junctions formed by low-energy (2-5 keV) ion implantation Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1996, 14 (01):
- [9] Dose rate and thermal budget optimization for ultrashallow junctions formed by low-energy (2-5 keV) ion implantation JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 255 - 259