On the dielectric material properties for thin film integrated RF and microwave applications

被引：0
|
作者：
Pieters, P. [1 ]
Brebels, S. [1 ]
Carchon, G. [1 ]
Vaesen, K. [1 ]
De Raedt, W. [1 ]
Beyne, E. [1 ]
Mertens, R.P. [1 ]
机构：
[1] IMEC, Leuven, Belgium
来源：
Advancing Microelectronics | 1999年 / 26卷 / 05期
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页码：19 / 23
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