Electrochemical aspects of corrosion resistance and etching of metallizations for microelectronics

被引：0

作者：

Comizzoli, R.B. ^{[1
]}

Frankenthal, R.P. ^{[1
]}

Hanson, K.J. ^{[1
]}

Konstadinidis, K. ^{[1
]}

Opila, R.L. ^{[1
]}

Sapjeta, J. ^{[1
]}

Sinclair, J.D. ^{[1
]}

Takahashi, K.M. ^{[1
]}

Frank, A.L. ^{[1
]}

Ibidunni, A.O. ^{[1
]}

机构：

[1] AT&T Bell Lab, Murray Hill, United States

来源：

Materials Science and Engineering A | 1995年 / A198卷 / 1-2期

关键词：

Etching;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：153 / 160

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