Sputtering of statistical and regular relief surfaces under ion bombardment

Surface relief influence on solids sputtering under ion bombardment has been investigated theoretically and by computer simulation. The theoretical analysis for the double prime statistical double prime relief with surface areas oriented in accordance with the normal distribution and the computer simulation for the regular relief constructed by pyramids of the repetitive size and shape allow one to find some common features of sputtering in spite of principal differences of the models used. Some of them are: non-monotonous dependence of sputtering yield S on the angle Θ1 of ion incidence, similar influence of the roughness degree on the shape of S(Θ1) dependence, weak dependence of sputtering efficiency on the roughness degree at some values of Θ1, extremal dependence of yield S on the mean inclination angle of roughness faces. The similarity of main dependences makes it possible to conclude about the possibility to simplify theoretical models for rough surface sputtering. Calculations have been accomplished for copper target under argon ion bombardment.