Transparent PLT thin films deposited by pulsed laser deposition

Transparent Pb0.72La0.28TiO3 thin films have been deposited on (100) LiF substrates by pulsed laser deposition technique employing a KrF laser (248 nm wavelength). The single perovskite target employed was prepared by sintering of the alkoxy-derived high-purity PLT powder at 1150 °C. Polycrystalline PLT thin films have been grown on (100) LiF substrates under the conditions of laser fluence 2.5 J/cm2, oxygen pressure 13 Pa and substrate temperature 750 °C. The structure, morphology and stoichiometry of the as-grown films and the employed target were characterized by XRD, SEM and EPMA technique, respectively. The optical transmittance spectrum of the as-grown thin film on LiF substrates in the wavelength range of 350 to approximately 2000 nm was measured.