Reaction behavior of SiO2 in Ca(OH)2 solution (Part 2) - in the case of SiO2 glass and Ca(OH)2 solution

被引：0
|
作者：
Okayama Univ, Okayama-shi, Japan [1 ]
机构：
来源：
J Ceram Soc Jpn | / 167-171期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
15
引用
收藏
相关论文
共 50 条
  • [31] INSTABILITY OF SIO2 COLLOIDS AND SORPTION OF CA2+ IONS
    CHAN, SP
    FRASER, DS
    CHENG, SYS
    XU, YN
    KOGA, Y
    CLAYS AND CLAY MINERALS, 1995, 43 (04) : 478 - 481
  • [32] Reduction processes in Cu/SiO2, Co/SiO2, and CuCo/SiO2 catalysts
    Smith, Miranda L.
    Campos, Andrew
    Spivey, James J.
    CATALYSIS TODAY, 2012, 182 (01) : 60 - 66
  • [33] RHEOLOGICAL BEHAVIOR OF SOLUTIONS AFFORDING SIO2 AND SIO2/ZRO2 FIBERS
    BRENNA, U
    CARTURAN, G
    SORARU, GD
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 134 (03) : 191 - 198
  • [34] SiO2 migration mechanism at the joints of SiO2f/SiO2 composite brazed by bismuth glass
    Wang, Haohan
    Lin, Jinghuang
    Cao, Jian
    Qi, Junlei
    CERAMICS INTERNATIONAL, 2022, 48 (17) : 24319 - 24325
  • [35] CO Adsorption Behavior of Cu/SiO2, Co/SiO2, and CuCo/SiO2 Catalysts Studied by in Situ DRIFTS
    Smith, Miranda L.
    Kumar, Nitin
    Spivey, James J.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2012, 116 (14): : 7931 - 7939
  • [36] ETCHING OF THERMALLY GROWN SIO2 BY NH4OH IN MIXTURE OF NH4OH AND H2O2 CLEANING SOLUTION
    KAIGAWA, H
    YAMAMOTO, K
    SHIGEMATSU, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7A): : 4080 - 4085
  • [37] Etching of thermally grown SiO2 by NH4OH in mixture of NH4OH and H2O2 cleaning solution
    Kaigawa, Hiroyuki, 1600, JJAP, Minato-ku, Japan (33):
  • [38] Enhanced ultraviolet photoluminescence from SiO2/Ge:SiO2/SiO2 sandwiched structure
    Shen, JK
    Wu, XL
    Yuan, RK
    Tang, N
    Zou, JP
    Mei, YF
    Tan, C
    Bao, XM
    Siu, GG
    APPLIED PHYSICS LETTERS, 2000, 77 (20) : 3134 - 3136
  • [39] ULTRASONIC RELAXATION LOSS IN OH-FREE SIO2
    STRAKNA, RE
    SAVAGE, HT
    JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) : 1363 - &
  • [40] BEHAVIOR OF IONS IN SIO2
    WILLIAMS, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06): : 1025 - 1027
12345