Aerosol-assisted chemical vapor deposition of copper

被引：0
|
作者：
Roger, C. [1 ]
Corbitt, T.S. [1 ]
Kodas, T.T. [1 ]
Hampden-Smith, M.J. [1 ]
机构：
[1] Univ of New Mexico, Albuquerque, United States
来源：
Journal of Aerosol Science | 1994年 / 25卷 / SUPPL 1期
关键词：
Aerosols - Copper - Crystalline materials - Low temperature operations - Silica - Substrates;
D O I：
10.1016/0021-8502(94)90341-7
中图分类号：
学科分类号：
摘要：
The paper reports quantitative results of a preliminary study of aerosol-assisted chemical vapor deposition (AACVD) of crystalline copper onto silica substrates at low temperatures. AACVD was found to provide increased deposition rates for other metals where precursors with low volatility were used.
引用
收藏
页码：221 / 222
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