Self-ordering of CoSi2 precipitates and epitaxial layer growth of CoSi2 on Si(100)

被引：0
|
作者：
Mantl, S. [1 ]
Hacke, M. [1 ]
Bay, H.L. [1 ]
Kappius, L. [1 ]
Mesters, St. [1 ]
机构：
[1] Forschungszentrum Juelich, Juelich, Germany
来源：
Thin Solid Films | 1998年 / 321卷
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摘要：
16
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页码：251 / 255
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