Surface analysis of TiN thin film deposited on silicon (100) by excimer laser

被引：0
|
作者：
机构：
来源：
Proc SPIE Int Soc Opt Eng | / 232-239期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] The effect of excimer laser etching on thin film diamond
    Chan, SSM
    Whitfield, MD
    Jackman, RB
    Arthur, G
    Goodall, F
    Lawes, RA
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2003, 18 (03) : S47 - S58
  • [32] Lateral diffusion of phosphorous induced by excimer laser irradiation of silicon thin film for formation of gradual lightly doped region in polycrystalline silicon thin film transistors
    Han, Sang-Myeon
    Park, Sang-Geun
    Seong, Seung-Yeon
    Kang, Chi-Jung
    Han, Min-Koo
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (10A): : 6525 - 6529
  • [33] Preferred growth of epitaxial TiN thin film on silicon substrate by pulsed laser deposition
    Xu, S
    Du, L
    Sugioka, K
    Toyoda, K
    Jyumonji, M
    JOURNAL OF MATERIALS SCIENCE, 1998, 33 (07) : 1777 - 1782
  • [34] Thin carbon nitride films deposited by laser ablation with an XeCl excimer laser
    Luches, A
    D'Anna, E
    Leggieri, G
    Martino, M
    Perrone, A
    Majni, G
    Mengucci, P
    Gyorgy, E
    Mihailescu, IN
    Popescu, M
    ALT '97 INTERNATIONAL CONFERENCE ON LASER SURFACE PROCESSING, 1998, 3404 : 91 - 98
  • [35] THIN-FILM DEPOSITION BY EXCIMER LASER EVAPORATION
    SCHEIBE, HJ
    GORBUNOV, AA
    BARANOVA, GK
    KLASSEN, NV
    KONOV, VI
    KULAKOV, MP
    POMPE, W
    PROKHOROV, AM
    WEISS, HJ
    THIN SOLID FILMS, 1990, 189 (02) : 283 - 291
  • [36] Preferred growth of epitaxial TiN thin film on silicon substrate by pulsed laser deposition
    S Xu
    L Du
    K Sugioka
    K Toyoda
    M Jyumonji
    Journal of Materials Science, 1998, 33 : 1777 - 1782
  • [37] Excimer mirror thin film laser damage competition
    Stolz, Christopher J.
    Blaschke, Holger
    Jensen, Lars
    Maedebach, Heinrich
    Ristau, Detlev
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2011, 2011, 8190
  • [38] Production solutions in excimer laser thin film crystallization
    Brune, J
    Nikolaus, B
    Simon, F
    THIN SOLID FILMS, 2005, 487 (1-2) : 85 - 88
  • [39] Thin film silicon devices deposited at 100 °C:: A study on the structural order of the photoactive layer
    Rath, J. K.
    Schropp, R. E. I.
    Cabarocas, Pere Roca i
    Tichelaar, F. D.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (19-25) : 2652 - 2656
  • [40] Disordered surface structure of an ultra-thin tin oxide film on Rh(100)
    Zenkyu, R.
    Tajima, D.
    Yuhara, J.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (06)
12345