AlN thin film deposition by ion beam sputtering

被引：0
|
作者：
Belyanin, A.F. [1 ]
Semenov, A.P. [2 ]
Haltanova, V.M. [2 ]
机构：
[1] Central Research Technological Institute, TECHNOMASH, Ivan Franko str. 4, 121355 Moscow, Russia
[2] Buryat Institute of Natural Sciences, Siberian Division, Russian Academy of Sciences, Sakhjanova str. 6, 670047 Ulan-Ude, Russia
来源：
Journal of Wide Bandgap Materials | 1997年 / 5卷 / 04期
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页码：336 / 340
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