Secondary processes during tantalum electrodeposition in molten salts

被引：0

作者：

Polyakova, L.P. ^{[1
]}

Polyakov, E.G. ^{[1
]}

Sorokin, A.I. ^{[1
]}

Stangrit, P.T. ^{[1
]}

机构：

[1] Acad of Sciences, Kola, Russia

来源：

| 1600年 / 22期

关键词：

Electrodeposition - Chemical Reactions - Electrolytic Cells - Analysis - Halogen Compounds - Electrolysis - Salts - Molten;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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[41] ELECTRODEPOSITION OF TUNGSTEN CARBIDE COATINGS FROM MOLTEN-SALTS
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[44] THE ELECTRODEPOSITION OF THE REFRACTORY-METALS FROM MOLTEN-SALTS
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[49] Electrodeposition of niobium and tantalum from a room-temperature molten salt system
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[50] Multistep processes in the electrodeposition of refractory metals in molten chlorides
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