Multi-ion species model with initial presheath profile for plasma source ion implantation

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作者：
Kim, Hyung-Jin [1 ]
机构：
[1] Inst for Advanced Engineering, Kyonggi-do, Korea, Republic of
来源：
Surface and Coatings Technology | 1999年 / 112卷 / 01期
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页码：318 / 323
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