Sematech papers

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Technology Review | 1993年 / 96卷 / 01期

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[41] Agility enabled by the SEMATECH CIM framework
Hawker, S
Waskiewicz, F
PLUG AND PLAY SOFTWARE FOR AGILE MANUFACTURING, 1997, 2913 : 69 - 95
[42] Benchmarking commercial EUVL resists at SEMATECH
Ma, Andy
Park, Joo-on
Dean, Kim
Wurm, Stefan
Naulleau, Patrick
EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921
[43] 36 STATES BID FOR SEMATECH CENTER
CHARLES, D
SCIENTIST, 1987, 1 (24): : 5 - 5
[44] SEMATECH CRAFTS AN OPEN CIM STRATEGY
MOAD, J
DATAMATION, 1991, 37 (17): : 59 - 60
[45] Studies of the SEMATECH IDDq test data
Ko, SB
Guo, YY
Lo, JC
JOURNAL OF SYSTEMS ARCHITECTURE, 2002, 47 (10) : 831 - 846
[46] Sematech, Veeco work on AFM improvement
不详
SOLID STATE TECHNOLOGY, 1997, 40 (07) : 68 - &
[47] Overview of SEMATECH's EUVL program
Wurm, S
EMLC 2005: 21st European Mask and Lithography Conference, 2005, 5835 : 212 - 229
[48] SEMATECH projects in advanced process control
Bogardus, EH
Bakshi, V
Gragg, J
1997 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING CONFERENCE PROCEEDINGS, 1997, : B25 - B28
[49] SEMATECH - TECHNO-POLICY IN ACTION
HAMILTON, DP
SCIENCE, 1991, 252 (5002) : 23 - 23
[50] NGL process and the role of International SEMATECH
Dao, G
Mackay, RS
Seidel, P
EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 29 - 35