Fine Structure of Crack in Yttrium Oxide and Aluminum Oxide Fluxed Silicon Nitride

被引：0
|
作者：
Kakibayashi, Hiroshi [1 ]
Shimotsu, Teruho [1 ]
Nagata, Fumio [1 ]
机构：
[1] Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo,185, Japan
来源：
Microscopy | 1985年 / 34卷 / 02期
关键词：
The authors wish to thank Mr. Kenji Maruta (Hitachi Metals Ltd.) for providing the specimen. The authors also thank Dr. Seiki Harada (Hitachi Central Research Laboratory) and Dr. Tadahiko Miyoshi (Hitachi Research Laboratory) for their encouragement;
D O I：
10.1093/oxfordjournals.jmicro.a050507
中图分类号：
学科分类号：
摘要：
3
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页码：78 / 84
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