Deposition of metastable Ti(1-x)AlxN films by plasma-enhanced CVD

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作者：
Prange, R. [1 ]
Neuschütz, D. [1 ]
机构：
[1] Lehrst. fur Theor. Huttenkunde, Rheinisch-Westfalische TH Aachen, 52056 Aachen, Germany
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
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页码：8 / 811
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