Deposition of metastable Ti(1-x)AlxN films by plasma-enhanced CVD

被引：0
|
作者：
Prange, R. [1 ]
Neuschütz, D. [1 ]
机构：
[1] Lehrst. fur Theor. Huttenkunde, Rheinisch-Westfalische TH Aachen, 52056 Aachen, Germany
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：8 / 811
相关论文
共 50 条
  • [1] Deposition of metastable Ti(1-x)AlxN films by plasma-enhanced CVD
    Prange, R
    Neuschütz, D
    JOURNAL DE PHYSIQUE IV, 1999, 9 (P8): : 811 - 818
  • [2] Plasma-Enhanced CVD Equipment for Deposition of Nanocomposite Nanolayered Films
    O. K. Porada
    V. I. Ivashchenko
    L. A. Ivashchenko
    A. O. Kozak
    O. O. Sytikov
    Journal of Superhard Materials, 2019, 41 : 32 - 37
  • [3] Plasma-Enhanced CVD Equipment for Deposition of Nanocomposite Nanolayered Films
    Porada, O. K.
    Ivashchenko, V. I.
    Ivashchenko, L. A.
    Kozak, A. O.
    Sytikov, O. O.
    JOURNAL OF SUPERHARD MATERIALS, 2019, 41 (01) : 32 - 37
  • [4] ASPECTS OF TIN AND TI DEPOSITION IN AN ECR PLASMA-ENHANCED CVD PROCESS
    WEBER, A
    NIKULSKI, R
    KLAGES, CP
    GROSS, ME
    CHARATAN, RM
    OPILAN, RL
    BROWN, WL
    APPLIED SURFACE SCIENCE, 1995, 91 (1-4) : 314 - 320
  • [5] PLASMA-ENHANCED CVD OF AMORPHOUS GEXS1-X AND GEXSE1-X FILMS
    SLEECKX, E
    NAGELS, P
    CALLAERTS, R
    VANROY, M
    JOURNAL DE PHYSIQUE IV, 1993, 3 (C3): : 419 - 426
  • [6] INTERMETAL DIELECTRIC DEPOSITION BY PLASMA-ENHANCED CVD
    OLMER, LJ
    LORY, ER
    CLAUHS, WW
    HARRUS, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) : C125 - C125
  • [7] PROPERTIES OF PLASMA-ENHANCED CVD SILICON FILMS .2. FILMS DOPED DURING DEPOSITION
    KAMINS, TI
    CHIANG, KL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (10) : 2331 - 2335
  • [8] A NEW DEPOSITION MODE IN PLASMA-ENHANCED CRYOGENIC CVD
    SHIN, H
    MIYAZAKI, S
    HIROSE, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 713 - 716
  • [9] DEPOSITION AND PROPERTIES OF PLASMA-ENHANCED CVD TITANIUM SILICIDE
    HARA, T
    ISHIZAWA, Y
    WU, HM
    ROSLER, RS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C484 - C484
  • [10] Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD
    Shimada, S
    Takada, Y
    Tsujino, J
    SURFACE & COATINGS TECHNOLOGY, 2005, 199 (01): : 72 - 76
12345