Correlation between material properties of ferroelectric thin films and design parameters for microwave device applications: modeling examples and experimental verification

被引：0
|
作者：
Miranda, Felix A. [1 ,2 ]
Van Keuls, Fred W. [1 ]
Subramanyam, Guru [3 ]
Mueller, Carl H. [1 ]
Romanofsky, Robert R. [1 ]
Rosado, G. [2 ]
机构：
[1] NASA Lewis Research Center, Cleveland, OH 44135, United States
[2] University of Puerto Rico, Humacao, PR 00791, Puerto Rico
[3] University of Dayton, Dayton, OH 45469, United States
来源：
Integrated Ferroelectrics | 1999年 / 24卷 / 01期
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页码：195 / 214
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