Influence of sputtering geometry on crystallinity of Al(110) thin films on offset (100)Si

被引：0
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作者：
Yokoyama, Shin [1 ]
Ichikawa, Hiroshi [1 ]
Koyanagi, Mitsumasa [1 ]
机构：
[1] Hiroshima Univ, Higashi, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 2 B期
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页码：283 / 286
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