Adhesion study of SiOx/PET films: Comparison between scratch test and fragmentation test

被引：0
|
作者：
Pitton, Y. [1 ]
Hamm, S.D. [1 ]
Lang, F.-R. [1 ]
Mathieu, H.J. [1 ]
Leterrier, Y. [2 ]
Månson, J.-A.E. [2 ]
机构：
[1] Laboratoire de Métallurgie Chimique, Département des Matériaux, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
[2] Laboratoire de Technologie des Composites et Polymères, Département des Matériaux, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
来源：
Journal of Adhesion Science and Technology | 1996年 / 10卷 / 10期
关键词：
Secondary ion mass spectrometry - Silicon compounds - Plasma applications - Testing;
D O I：
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学科分类号：
摘要：
Scratch and fragmentation tests were performed on 100 nm thick SiO x, coatings (1.1 x 2) deposited on PET substrates with and without prior N2-plasma treatment. A correlation was found between the critical normal forces measured during scratching and crack densities at fragmentation saturation. Quantification of the works of adhesion, and a comparison of their values for the scratch and fragmentation tests were possible by a comparison of the model developed by Bull, Burnett and Rickerby for the former, and Kelly and Tyson's model combined with the approach from Nardin and Schultz for the latter. © 1996 VSP.
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页码：1047 / 1065
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