Adhesion study of SiOx/PET films: Comparison between scratch test and fragmentation test

被引：0

作者：

Pitton, Y. ^{[1
]}

Hamm, S.D. ^{[1
]}

Lang, F.-R. ^{[1
]}

Mathieu, H.J. ^{[1
]}

Leterrier, Y. ^{[2
]}

Månson, J.-A.E. ^{[2
]}

机构：

[1] Laboratoire de Métallurgie Chimique, Département des Matériaux, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

[2] Laboratoire de Technologie des Composites et Polymères, Département des Matériaux, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

来源：

Journal of Adhesion Science and Technology | 1996年 / 10卷 / 10期

关键词：

Secondary ion mass spectrometry - Silicon compounds - Plasma applications - Testing;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Scratch and fragmentation tests were performed on 100 nm thick SiO x, coatings (1.1 x 2) deposited on PET substrates with and without prior N2-plasma treatment. A correlation was found between the critical normal forces measured during scratching and crack densities at fragmentation saturation. Quantification of the works of adhesion, and a comparison of their values for the scratch and fragmentation tests were possible by a comparison of the model developed by Bull, Burnett and Rickerby for the former, and Kelly and Tyson's model combined with the approach from Nardin and Schultz for the latter. © 1996 VSP.

引用

页码：1047 / 1065

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[1] Adhesion study of SiOx/PET films: Comparison between scratch test and fragmentation test
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