Effect of D.C. bias on the synthesis of crystalline carbon nitrides on silicon by microwave plasma enhanced chemical vapor deposition (CVD)

被引：0
|
作者：
Natl Tsing-Hua Univ, Hsinchu, Taiwan [1 ]
机构：
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1998年 / 37卷 / 2 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Remote microwave plasma-enhanced chemical vapor deposition of amorphous carbon on silicon and titanium alloy substrates
    Tixier, C
    Tristant, P
    Desmaison, J
    Ranc, R
    SURFACE & COATINGS TECHNOLOGY, 1996, 80 (1-2): : 129 - 133
  • [32] Substrate bias effect on the formation of nanocrystalline diamond films by microwave plasma-enhanced chemical vapor deposition
    Yang, TS
    Lai, JY
    Wong, MS
    Cheng, CL
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (04) : 2133 - 2138
  • [33] Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition
    Sanchez, G.
    Tristant, P.
    Dublanche-Tixier, C.
    Tetard, F.
    Bologna Alles, A.
    SURFACE & COATINGS TECHNOLOGY, 2014, 256 : 3 - 8
  • [34] THE EFFECT OF OXYGEN IN DIAMOND DEPOSITION BY MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    LIOU, Y
    INSPEKTOR, A
    WEIMER, R
    KNIGHT, D
    MESSIER, R
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) : 2305 - 2312
  • [35] Process diagnostics for remote plasma-enhanced chemical-vapor deposition (PECVD) of silicon nitrides
    Banerjee, A
    Lucovsky, G
    DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS PROCESSING II, 1996, 406 : 63 - 68
  • [36] Synthesis of vertical graphene by microwave plasma enhanced chemical vapor deposition techniquef
    Bisht, Atul
    Chockalingam, Sreekumar
    Panwar, O. S.
    Singh, B. P.
    Kesarwani, Ajay
    Chand, Jagdish
    PHYSICS OF SEMICONDUCTOR DEVICES, 2014, : 559 - 562
  • [37] Effect of Gas Sources on the Deposition of Nano-Crystalline Diamond Films Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition
    翁俊
    熊礼威
    汪建华
    满卫东
    陈冠虎
    Plasma Science and Technology, 2010, 12 (06) : 761 - 764
  • [38] Effect of Gas Sources on the Deposition of Nano-Crystalline Diamond Films Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition
    Weng Jun
    Xiong Liwei
    Wang Jianhua
    Man Weidong
    Chen Guanhu
    PLASMA SCIENCE & TECHNOLOGY, 2010, 12 (06) : 761 - 764
  • [39] Effect of Gas Sources on the Deposition of Nano-Crystalline Diamond Films Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition
    翁俊
    熊礼威
    汪建华
    满卫东
    陈冠虎
    Plasma Science and Technology, 2010, (06) : 761 - 764
  • [40] Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition
    Chen, LC
    Bhusari, DM
    Yang, CY
    Chen, KH
    Chuang, TJ
    Lin, MC
    Chen, CK
    Huang, YF
    THIN SOLID FILMS, 1997, 303 (1-2) : 66 - 75
12345