A new inspection method for phase-shift mask (PSM) on deep-UV inspection light source

被引：0
|
作者：
Advanced LSI Technology Laboratory, Corporate Res. and Devmt. Center, Toshiba Corporation, 1 Komukai-toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan [1 ]
机构：
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
Phase-shift masks (PSM);
D O I：
10.1143/jjap.41.4233
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：4233 / 4237
相关论文
共 50 条
  • [1] A new inspection method for phase-shift mask (PSM) on deep-UV inspection light source
    Isomura, I
    Tsuchiya, H
    Sugihara, S
    Yamashita, K
    Tabata, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B): : 4233 - 4237
  • [2] A new inspection method for PSM on DUV inspection light source
    Isomura, I
    Tsuchiya, H
    Sugihara, S
    Yamashita, K
    Tabata, M
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 64 - 65
  • [3] Reticle inspection enters the deep-UV
    不详
    SOLID STATE TECHNOLOGY, 2000, 43 (11) : 32 - 32
  • [4] Direct phase-shift measurement with transmitted deep-UV illumination
    Kusunose, H
    Awamura, N
    Takizawa, H
    Miyazaki, K
    Ode, T
    Awamura, D
    PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 251 - 260
  • [5] Semiconductor inspection moves to deep-UV imaging
    Tower, JR
    PHOTONICS SPECTRA, 2004, 38 (07) : 100 - 101
  • [6] New approaches to alternating phase shift mask inspection
    Zurbrick, L
    Heumann, J
    Rudzinski, M
    Stokowski, S
    Urbach, JP
    Wang, L
    21ST ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4562 : 138 - 144
  • [7] New approaches to alternating phase shift mask inspection
    KLA-Tencor Corporation, 160 Rio Robles, San Jose, CA 95134-1809, United States
    Proc SPIE Int Soc Opt Eng, (138-144):
  • [8] Programmable deep-UV laser platform for inspection and metrology
    Miyata, Kentaro
    Mohara, Mizuki
    Shimura, Kei
    Tanabashi, Akihiro
    Desbiens, Louis
    Roy, Vincent
    Taillon, Yves
    Nakayama, Shinichi
    Wada, Satoshi
    OPTICS LETTERS, 2019, 44 (22) : 5618 - 5621
  • [9] Tritone inspection for embedded phase shift mask
    Cheng, WH
    Farnsworth, J
    Tejnil, E
    20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 818 - 826
  • [10] Defect inspection and printability of deep UV halftone phase-shifting mask
    Kim, HJ
    Hong, JS
    Kye, JW
    Cha, DH
    Kang, HY
    Moon, JT
    17TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3236 : 430 - 440
12345