Extrusion-spin coating: An efficient photoresist coating process for wafers

被引：0
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作者：
Derksen, James [1 ]
Han, Sangjun [1 ]
Chun, Jung-Hoon [1 ]
机构：
[1] Massachusetts Inst of Technology, Cambridge, United States
来源：
IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings | 1999年
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页码：245 / 248
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