Gas discharged based radiation source for EUV-lithography

被引：0
|
作者：
Lebert, R. [1 ]
Bergmann, K. [1 ]
Schriever, G. [1 ]
Neff, W. [2 ]
机构：
[1] Lehrstuhl für Lasertechnik, RWTH Aachen, Steinbachstraße 15, D-52074 Aachen, Germany
[2] Fraunhofer-Inst. fur Lasertechnik, Steinbachstraße 15, D-52074 Aachen, Germany
来源：
Microelectronic Engineering | 1999年 / 46卷 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：449 / 452
相关论文
共 50 条
  • [31] Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
    Kim, Hyun-su
    Baksh, Peter
    Odstrcil, Michal
    Miszczak, Magdalena
    Frey, Jeremy G.
    Juschkin, Larissa
    Brocklesby, William S.
    APPLIED PHYSICS EXPRESS, 2016, 9 (07)
  • [32] Performance of gas jet type Z-pinch plasma light source for EUV lithography
    Song, Inho
    Kobayashi, Yasunori
    Sakamoto, Toshiro
    Mohanty, Smruti R.
    Watanabe, Masato
    Okino, Akitoshi
    Kawamura, Toru
    Yasuoka, Koichi
    Horioka, Kazuhiko
    Hotta, Eiki
    MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) : 710 - 713
  • [33] Progress of a laser plasma EUV light source for lithography
    Endo, A
    2003 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2, 2003, : 220 - 221
  • [34] Update of EUV Source Development Status for HVM Lithography
    Mizoguchi, Hakaru
    Nowak, Krzysztof M.
    Nakarai, Hiroaki
    Abe, Tamotsu
    Ohta, Takeshi
    Kawasuji, Yasufumi
    Tanaka, Hiroshi
    Watanabe, Yukio
    Hori, Tsukasa
    Kodama, Takeshi
    Shiraishi, Yutaka
    Yanagida, Tatsuya
    Yamada, Tsuyoshi
    Yamazaki, Taku
    Okazaki, Shinji
    Saitou, Takashi
    JOURNAL OF LASER MICRO NANOENGINEERING, 2016, 11 (02): : 276 - 284
  • [35] LPP-EUV light source for HVM lithography
    Saito, T.
    Ueno, Y.
    Yabu, T.
    Kurosawa, A.
    Nagai, S.
    Yanagida, T.
    Hori, T.
    Kawasuji, Y.
    Abe, T.
    Kodama, T.
    Nakarai, H.
    Yamazaki, T.
    Mizoguchi, H.
    XXI INTERNATIONAL SYMPOSIUM ON HIGH POWER LASER SYSTEMS AND APPLICATIONS 2016, 2017, 10254
  • [36] Development of laser produced plasma source for EUV lithography
    Institute of Electrical Engineering, Chinese Acad. of Sci., Beijing 100080, China
    Weixi Jiagong Jishu, 2006, 5 (1-7+12):
  • [37] A 6.7-nm beyond EUV source as a future lithography source
    Otsuka, Takamitsu
    Li, Bowen
    O'Gorman, Colm
    Cummins, Thomas
    Kilbane, Deirdre
    Higashiguchi, Takeshi
    Yugami, Noboru
    Jiang, Weihua
    Endo, Akira
    Dunne, Padraig
    O'Sullivan, Gerry
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322
  • [38] Plasma and radiation modelling of EUV sources for micro lithography
    Kruecken, Thomas
    ATOMIC AND MOLECULAR DATA AND THEIR APPLICATIONS, 2007, 901 : 181 - 190
  • [39] Holographic masks for computational proximity lithography with EUV radiation
    Deuter, V.
    Grochowicz, M.
    Brose, S.
    Biller, J.
    Danylyuk, S.
    Taubner, T.
    Gruetzmacher, D.
    Juschkin, L.
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
  • [40] Metal Based Materials for EUV Lithography
    Kosma, Vasiliki
    De Simone, Danilo
    Vandenberghe, Geert
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2019, 32 (01) : 179 - 183
12345