Influence of the forming electrolyte on the electrical properties of tantalum and niobium oxide films: an EIS comparative study

被引：0
|
作者：
Universidad Nacional de Cordoba, Cordoba, Argentina [1 ]
机构：
来源：
J Appl Electrochem | / 11卷 / 1213-1219期
关键词：
Number:; -; Acronym:; CIEMAT; Sponsor: Centro de Investigaciones Energéticas; Medioambientales y Tecnológicas; SECYT; Sponsor: Secretaria de Ciencia y Tecnica; Universidad de Buenos Aires; UNC; Sponsor: Universidad Nacional de Córdoba;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] COMPOSITION AND ELECTRICAL-PROPERTIES OF OWN OXIDE-FILMS ON NITROGENIZED NIOBIUM
    BOIKO, BT
    KOPACH, VR
    PANCHEKHA, PA
    POZDEYEV, YL
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1988, 31 (10): : 115 - 116
  • [42] Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers
    Cacucci, Arnaud
    Loffredo, Stephane
    Potin, Valerie
    Imhoff, Luc
    Martin, Nicolas
    SURFACE & COATINGS TECHNOLOGY, 2013, 227 : 38 - 41
  • [43] ELECTRICAL BREAKDOWN AND ELECTRONIC CURRENT OF TANTALUM TANTALUM OXIDE AQUEOUS-ELECTROLYTE SYSTEMS
    KALRA, KC
    KATYAL, P
    THIN SOLID FILMS, 1991, 201 (02) : 203 - 216
  • [44] OXIDATION OF TITANIUM, TANTALUM, AND NIOBIUM FILMS BY OXYGEN AND NITROUS-OXIDE
    SALEH, JM
    MATLOOB, MH
    JOURNAL OF PHYSICAL CHEMISTRY, 1974, 78 (24): : 2486 - 2489
  • [45] Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing
    Chandra, S. V. Jagadeesh
    Choi, Chel-Jong
    Uthanna, S.
    Rao, G. Mohan
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2010, 13 (04) : 245 - 251
  • [46] ELECTRICAL CONDUCTION THROUGH THIN FILMS OF TANTALUM OXIDE
    HORIUCHI, S
    SASAMI, T
    YAMAGUCHI, J
    ELECTRICAL ENGINEERING IN JAPAN, 1966, 86 (04) : 48 - +
  • [47] Study on the influence of electrolyte on the electrical performance of high-temperature wet tantalum capacitors
    Liu, Zhong'e
    Li, Dong
    Wang, Yong
    Zhao, Peng
    Bai, Liang
    Yan, Hongying
    Yadian Yu Shengguang/Piezoelectrics and Acoustooptics, 2000, 22 (04): : 230 - 233
  • [48] PORES IN TANTALUM OXIDE FILMS AND THEIR INFLUENCE ON THE PHOTORESPONSE
    DREINER, R
    SCHIMMEL, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (04) : 453 - 456
  • [49] Influence of deposition pressure on microstructure, mechanical and electrical properties of niobium thin films
    Rao, P. N.
    Swami, M. K.
    Ghosh, Amrit
    Jangir, R.
    Rai, S. K.
    THIN SOLID FILMS, 2024, 805
  • [50] MAGNETIC-PROPERTIES AND STRUCTURE OF CHROMIUM NIOBIUM OXIDE AND IRON TANTALUM OXIDE
    CHRISTENSEN, AN
    JOHANSSON, T
    LEBECH, B
    JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1976, 9 (13): : 2601 - 2610
12345