Surface tension, adhesion and wetting of materials for photolithographic process

被引：0
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作者：
Bauer, J. [1 ]
Drescher, G. [1 ]
Illig, M. [1 ]
机构：
[1] Inst for Semiconductor Physics, Frankfurt, Germany
来源：
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 1996年 / 14卷 / 04期
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页码：2485 / 2492
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