Selective tungsten chemical vapor deposition with high deposition rate for ULSI application

被引：0
|
作者：
Suzuki, Hiroshi [1 ]
Maeda, Yuuji [1 ]
Morita, Kenji [1 ]
Morita, Mizuho [1 ]
Ohmi, Tadahiro [1 ]
机构：
[1] Tohoku Univ, Sendai, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 1 B期
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页码：451 / 454
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