Thin films of amorphous silicon-tin alloy prepared by radio-frequency magnetron sputtering

被引:0
|
作者
Maruyama, Toshiro [1 ]
Akagi, Hisao [1 ]
机构
[1] Kyoto Univ, Kyoto, Japan
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] RESEARCH ON THE CHARACTERISTICS OF AMORPHOUS SILICON-TIN ALLOY-FILMS
    LI, CJ
    YIN, YB
    XU, WY
    CHINESE PHYSICS, 1987, 7 (04): : 1119 - 1124
  • [32] Characteristics of ZnO thin films prepared by radio frequency magnetron sputtering
    Yang, Ping-Feng
    Wen, Hua-Chiang
    Jian, Sheng-Rui
    Lai, Yi-Shao
    Wu, Sean
    Chen, Rong-Sheng
    MICROELECTRONICS RELIABILITY, 2008, 48 (03) : 389 - 394
  • [33] Copper nitride thin films prepared by radio frequency magnetron sputtering
    Xiao, Jian-Rong
    Xu, Hui
    Liu, Xiao-Liang
    Li, Yan-Feng
    Zhang, Peng-Hua
    Jian, Xian-Zhong
    Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals, 2007, 17 (03): : 368 - 372
  • [34] Inorganic electret using SiO2 thin, films prepared by radio-frequency magnetron sputtering
    Minami, T
    Utsubo, T
    Miyata, T
    Ohbayashi, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 1178 - 1182
  • [35] Preparation of Indium Tin Oxide Films on Polycarbonate substrates by Radio-frequency Magnetron Sputtering
    刘静
    JournalofWuhanUniversityofTechnology-MaterialsScience, 2005, (04) : 22 - 25
  • [36] Revealing plasmonic TiN films with low power radio-frequency magnetron sputtering technique
    Samanta, Atanu
    Chattaraj, Ananya
    Srivastava, Sachin
    Walczak, Lukasz
    Sagdeo, Archna
    Kanjilal, Aloke
    THIN SOLID FILMS, 2025, 811
  • [37] Magnetoresistance of silver-amorphous alloy thin films prepared by magnetron sputtering
    Nishimura, O.
    Tonooka, K.
    Shimokawa, K.
    Shinku/Journal of the Vacuum Society of Japan, 2001, 44 (03) : 240 - 243
  • [38] Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering
    Wu, WF
    Chiou, BS
    THIN SOLID FILMS, 1997, 298 (1-2) : 221 - 227
  • [39] Preparation of indium tin oxide films on mycarbonate substrates by radio-frequency magnetron sputtering
    Liu, J
    Gong, J
    Gu, ZA
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2005, 20 (04): : 22 - 25
  • [40] An investigation on the effect of high partial pressure of hydrogen on the nanocrystalline structure of silicon carbide thin films prepared by radio-frequency magnetron sputtering
    Daouahi, Mohsen
    Omri, Mourad
    Kerm, Abdul Ghani Yousseph
    Al-Agel, Faisal Abdulaziz
    Rekik, Najeh
    SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY, 2015, 136 : 1409 - 1417