INDUSTRIAL APPLICATIONS OF PASSIVATED ION-IMPLANTED SILICON DETECTORS.

被引：0
|
作者：
Burger, P. [1 ]
Beroud, Y. [1 ]
机构：
[1] ENERTEC Schlumberger, Nuclear, Instrumentation Dep, Lingolsheim, Fr, ENERTEC Schlumberger, Nuclear Instrumentation Dep, Lingolsheim, Fr
来源：
Nuclear instruments and methods in physics research | 1983年 / 226卷 / 01期
关键词：
RADIOACTIVITY MEASUREMENT;
D O I：
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中图分类号：
学科分类号：
摘要：
Three industrial applications have been developed with silicon passivated ion-implanted detectors. The first one is based on high resolution alpha spectroscopy reached with this kind of detector at room temperature. The second one deals with large area silicon detectors for alpha monitoring and the necessary reproducibility of the process. The last approach concerns silicon detectors used in the current mode.
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页码：45 / 49
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