Photon/fragment-ion coincidence investigation of the continuous ultraviolet emissions produced by fast ion impact on CF4 and CHF3

被引：0

作者：

机构：

[1] Muller, U.

[2] Lange, M.

[3] Haas, W.

[4] Brenn, R.

来源：

Muller, U. | 1600年 / American Inst of Physics, Woodbury, NY, United States卷 / 100期

关键词：

Molecular physics;

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暂无

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引用

共 29 条

[21] Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Baklanov, MR
Vanhaelemeersch, S
Storm, W
Kim, YB
Vandervorst, W
Maex, K
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (06): : 3005 - 3014
[22] Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
Jun-Hyun Kim
Chang-Koo Kim
Korean Journal of Chemical Engineering, 2020, 37 : 374 - 379
[23] Ionization and fragmentation of CCl2F2, CClF3, CF4, and CHF3 by positron impact -: art. no. 052708
Moxom, J
Schrader, DM
Laricchia, G
Xu, J
Hulett, LD
PHYSICAL REVIEW A, 2000, 62 (05): : 052708 - 052701
[24] DISSOCIATIVE ATTACHMENT AND ION-PAIR FORMATION IN CF4, CHF3, CH2F2, AND CH3F UNDER LOW-ENERGY (0-20 EV) ELECTRON-IMPACT
SCHEUNEMANN, HU
HENI, M
ILLENBERGER, E
BAUMGARTEL, H
BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1982, 86 (04): : 321 - 326
[25] Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures
Efremov A.M.
Bobylev A.V.
Kwon K.-H.
Russian Microelectronics, 2023, 52 (04) : 267 - 275
[26] MEASUREMENTS OF NEGATIVE-ION DENSITIES IN 13.56-MHZ RF PLASMAS OF CF4, C2F6, CHF3, AND C3F8 USING MICROWAVE RESONANCE AND THE PHOTODETACHMENT EFFECT
HAVERLAG, M
KONO, A
PASSCHIER, D
KROESEN, GMW
GOEDHEER, WJ
DEHOOG, FJ
JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) : 3472 - 3480
[27] Contribution of the 4p sublevel to the Balmer-β emission intensity from H(n=4) produced in electron-H2, CHF3, CH4 and C3H8 collisions as studied by photon-photon coincidence experiments
Furuya, K
Shimoida, Y
Matsuo, K
Hatano, Y
CHEMICAL PHYSICS, 2003, 295 (03) : 229 - 234
[28] OPTICAL-EMISSIONS IN THE WAVELENGTH REGION 2000-6000 A PRODUCED BY ELECTRON-IMPACT DISSOCIATION OF NF3, CF4 AND SF6
BLANKS, KA
BECKER, K
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1987, 20 (22) : 6157 - 6163
[29] Atomic fluorine emission cross sections observed in the 600-900 nm region following 0-500 eV electron impact on fluoromethanes (CF4, CHF3, CH2F2 and CH3F)
Torres, I
Martínez, R
Rayo, MNS
Fernández, JA
Castaño, F
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1999, 32 (23) : 5437 - 5450

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