共 29 条
- [1] PHOTON FRAGMENT-ION COINCIDENCE INVESTIGATION OF THE CONTINUOUS ULTRAVIOLET EMISSIONS PRODUCED BY FAST-ION IMPACT ON CF4 AND CHF3 JOURNAL OF CHEMICAL PHYSICS, 1994, 100 (08): : 5550 - 5555
- [4] Reactive ion etching of piezoelectric materials in CF4/CHF3 plasmas JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2037 - 2041
- [5] REACTIVE ION ETCHING OF SPUTTER DEPOSITED TANTALUM WITH CF4, CF3CL, AND CHF3 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (1A): : 179 - 185
- [6] Reactive ion etching of sputter deposited tantalum with CF4, CF3Cl, and CHF3 Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (1 A): : 179 - 185
- [8] Dissociative ionization of CF4 and CHF3 accompanying light emission:: Fragmention-photon coincidence (FIPCO) measurements by electron impact PHOTONIC, ELECTRONIC AND ATOMIC COLLISIONS, 2002, : 381 - 392