共 50 条
- [32] Influence of process parameters on the properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (02): : 328 - 333
- [34] Tungsten carbide thin films Review: Effect of deposition parameters on film microstructure and properties 2ND INTERNATIONAL CONFERENCE ON SUSTAINABLE MATERIALS PROCESSING AND MANUFACTURING (SMPM 2019), 2019, 35 : 522 - 528
- [37] SYNTHESIS AND CHARACTERIZATION OF MWCNTS COATED WITH TITANIUM CARBIDE THIN FILMS NANOCON 2014, 6TH INTERNATIONAL CONFERENCE, 2015, : 99 - 103
- [38] The influence of deposition process parameters on protective properties of silane films OCHRONA PRZED KOROZJA, 2020, 63 (01): : 8 - 11