Influence of deposition parameters on the structure of Al, Zr and W coatings deposited by closed-field unbalanced magnetron sputtering

被引：0
|
作者：
Univ of Salford, Salford, United Kingdom [1 ]
机构：
来源：
Surf Coat Technol | / 1 -3 pt 1卷 / 425-431期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Structures and Properties of C-Doped NiCr Thin Film Deposited by Closed-Field Unbalanced Magnetron Sputtering
    Lifei Lai
    Jinxia Wang
    Hongtao Wang
    Mingdong Bao
    Journal of Electronic Materials, 2017, 46 : 552 - 562
  • [22] Structures and Properties of C-Doped NiCr Thin Film Deposited by Closed-Field Unbalanced Magnetron Sputtering
    Lai, Lifei
    Wang, Jinxia
    Wang, Hongtao
    Bao, Mingdong
    JOURNAL OF ELECTRONIC MATERIALS, 2017, 46 (01) : 552 - 562
  • [23] Structural and tribological properties of CrTiAlN coatings on Mg alloy by closed-field unbalanced magnetron sputtering ion plating
    Shi, Yongjing
    Long, Siyuan
    Yang, Shicai
    Pan, Fusheng
    APPLIED SURFACE SCIENCE, 2008, 254 (22) : 7342 - 7350
  • [24] Composition, structure and properties of SiN, films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering
    Yao, ZQ
    Yang, P
    Huang, N
    Sun, H
    Wan, GJ
    Leng, YX
    Chen, JY
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 240 (03): : 741 - 751
  • [25] Synthesis, microstructural and mechanical properties of self-lubricating Mo-Se-C coatings deposited by closed-field unbalanced magnetron sputtering
    Vuchkov, Todor
    Bin Yaqub, Talha
    Evaristo, Manuel
    Cavaleiro, Albano
    SURFACE & COATINGS TECHNOLOGY, 2020, 394
  • [26] Bias voltage and mechanical properties of CrN coatings deposited by closed field unbalanced magnetron sputtering
    Institute of Materials Science and Engineering, Ningbo University of Technology, Ningbo 315016, China
    不详
    不详
    Zhenkong Kexue yu Jishu Xuebao, 2009, 5 (565-569):
  • [27] The determination of the current-voltage characteristics of a closed-field unbalanced magnetron sputtering system
    Kelly, PJ
    Arnell, RD
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1370 - 1376
  • [28] Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering
    Myung, HS
    Park, YS
    Jung, MJ
    Hong, B
    Han, JG
    MATERIALS LETTERS, 2004, 58 (09) : 1513 - 1516
  • [29] Mechanical Properties and Thermal Stability of CrSiN/AlN Multilayer Coatings Using a Closed-Field Unbalanced Magnetron Sputtering System
    Kim, Sung-Min
    Kim, Gwang-Seok
    Lee, Sang-Yul
    Lee, Jae-Wook
    Lee, Jeong-Yong
    Lee, Bo-Young
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 54 (03) : 1109 - 1114
  • [30] HIGH-RATE REACTIVE SPUTTERING IN AN OPPOSED CATHODE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEM
    SPROUL, WD
    RUDNIK, PJ
    GRAHAM, ME
    ROHDE, SL
    SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3): : 270 - 278
12345